2025/12/16 by Ersyzario Edo Yunata, Angga Dito Fauzi, Yunata, Ersyzario Edo +11
Engineering · Materials Science · #2D Materials and Applications #FOS: Physical sciences #Graphene research and applications #Optics (physics.optics) #Plasmonic and Surface Plasmon Research
paper · pdf · doi:10.48550/arxiv.2512.14294
openalex publication_date 2025/12/16 · openalex created_date 2025/12/18 · openalex updated_date 2026/07/28
Spectroscopic ellipsometry (SE) has emerged as a powerful and non-destructive optical characterization technique for probing the complex dielectric properties of two-dimensional (2D) materials. This review provides a comprehensive overview of ellipsometric methods applied to atomically thin and multilayer van der Waals materials, including graphene, transition metal dichalcogenides, and other emerging 2D systems. We discuss experimental configurations, optical modeling strategies, and challenges associated with reduced dimensionality, anisotropy, and substrate effects. Advanced techniques such as Mueller matrix ellipsometry are highlighted for their capability to resolve in-plane and out-of-plane dielectric tensor components in anisotropic and low-symmetry materials. Furthermore, we review recent discoveries enabled by ellipsometry, including extreme optical anisotropy, hyperbolic dispersion, and tunable plasmonic responses in multilayer 2D materials. These findings establish spectroscopic ellipsometry as an essential tool for both fundamental studies and photonic device engineering based on two-dimensional materials.