2025/01/24 by Chun He, He, Changchao, Hanxiang Yang +7
Engineering · Physics and Astronomy · #Accelerator Physics (physics.acc-ph) #Advanced X-ray Imaging Techniques #Advancements in Photolithography Techniques #FOS: Physical sciences #Photocathodes and Microchannel Plates
paper · pdf · doi:10.48550/arxiv.2501.14541
openalex publication_date 2025/01/24 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this field. However, current LPP light sources may provide insufficient average power to enable future manufacturing at the 3 nm node and below. In this context,accelerator-based light sources are being considered as promising tools for EUV lithography. This paper proposes a regenerative amplifier free-electron laser EUV source with harmonic lasing, drivenby a superconducting energy-recovery linac (ERL). By utilizing the nth harmonic, the required electron beam energy is reduced to 1/sqrt(n) of that in conventional schemes. The proposed configuration, employing an electron beam energy of approximately 0.33 GeV with a short-period (16 mm) undulator, is estimated to provide an average EUV power of about 2 kW. This approach significantly reduces the required electron energy and facility size relative to other accelerator-based proposals,thereby offering new possibilities for constructing high-power EUV sources with low-energy ERLs.