2014/11/12 by Satyananda Kar, Kar, Satyananda, L. Alberts +4 · 1 citation
Engineering · Materials Science · Physics and Astronomy · #Copper Interconnects and Reliability #FOS: Physical sciences #Metal and Thin Film Mechanics #Plasma Diagnostics and Applications #Plasma Physics (physics.plasm-ph) #physics.plasm-ph
paper · pdf · doi:10.48550/arxiv.1411.3072
10 pages, 5 figures
arxiv created 2014/11/12 · openalex publication_date 2014/11/12 · arxiv updated 2014/11/13 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
In recent decades, different types of plasma sources have been used for various types of plasma processing, such as, etching and thin film deposition. The critical parameter for effective plasma processing is high plasma density. One type of high density plasma source is Microwave sheath-Voltage combination Plasma (MVP). In the present investigation, a better design of MVP source is reported, in which over-dense plasma is generated for low input microwave powers. The results indicate that the length of plasma column increases significantly with increase in input microwave power.