2016/05/20 by Janardan Upadhyay, Ari Palczewski, Upadhyay, J. +11
Engineering · Physics and Astronomy · #Accelerator Physics (physics.acc-ph) #Atomic Physics (physics.atom-ph) #FOS: Physical sciences #Particle accelerators and beam dynamics #Physics of Superconductivity and Magnetism #Plasma Diagnostics and Applications #Plasma Physics (physics.plasm-ph)
paper · pdf · doi:10.48550/arxiv.1605.06494
openalex publication_date 2016/05/20 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28
Plasma etching has a potential to be an alternative processing technology for superconducting radio frequency (SRF) cavities. An apparatus and a method are developed for plasma etching of the inner surfaces of SRF cavities. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity is used. The single cell cavity is mechanically polished, buffer chemically etched afterwards and rf tested at cryogenic temperatures for a baseline test. This cavity is then plasma processed. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise manner to establish segmented plasma processing. The cavity is rf tested afterwards at cryogenic temperatures. The rf test and surface condition results are presented.