2024/10/16 by Tianshi Lü, Fuyuan Deng, Lu, Tianshi +7
Engineering · Materials Science · #Electrowetting and Microfluidic Technologies #FOS: Physical sciences #Nanofabrication and Lithography Techniques #Optical Coatings and Gratings #Optics (physics.optics)
paper · pdf · doi:10.48550/arxiv.2410.12573
openalex publication_date 2024/10/16 · openalex created_date 2024/10/20 · openalex updated_date 2026/07/28
Subwavelength grating micro-polarizer arrays, as a type of focal plane division simultaneous detection method, are significantly advancing the development and practical application of polarization imaging technology. Based on the cross-scale, dual-period characteristics of the grating array, this paper proposes a fabrication method that combines laser interference lithography with contact lithography. This method constructs a complete single-layer micro-polarizer array photoresist pattern through a four-step lithography process. Compared to traditional point-by-point fabrication methods like EBL and FIB, the patterning time is reduced by 3 to 4 orders of magnitude. Additionally, by introducing a refractive index matching liquid and an alignment method based on substrate contours, the effects of gaps and splicing errors are minimized, resulting in high-quality photoresist patterns with splicing errors less than 1μm. Finally, a double-layer metal grating structure was obtained through pattern transfer. Performance tests show that the micro-polarizer array achieves a maximum transmittance of over 50% and an extinction ratio exceeding 15dB in the 3-15μm wavelength range. This exploration offers a low-cost, high-efficiency path for fabricating micro-polarizer arrays.