2025/05/06 by Ch. Kishan Singh, K Rajalakshmi, Singh, Ch Kishan +11
Engineering · #Acoustic Wave Resonator Technologies #Advanced MEMS and NEMS Technologies #FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci) #Ultrasonics and Acoustic Wave Propagation
paper · pdf · doi:10.48550/arxiv.2505.03190
openalex publication_date 2025/05/06 · openalex created_date 2025/10/16 · openalex updated_date 2026/07/28
We present a methodology to mitigate the effect of the parasitic electrostatic contribution usually present in piezoresponse force microscopy (PFM) measurement for quantitative characterization of polycrystalline piezoelectric thin films using a case study on a set of Al1-xScxN thin films. It involves minimizing the voltage sensitivity of the measured piezoresponse by optimizing the optical lever sensitivity using the laser positioning of the beam-bounce system. Additionally, applying a dc-voltage offset (determined through Kelvin probe force microscopy) during PFM scans and positioning the probe over the interior or edge portion of the specimen are explored to minimize the local and non-local electrostatic tip-sample interaction. The results shows that the effective piezoelectric coefficient (d33-eff) of our c-axis oriented wurtzite (wz)-Al1.0Sc0.0N thin film is 4.9 pm per Volt. The highest enhancement in the d33-eff value occurred in the wz-Al0.58Sc0.42N thin film. Above x = 0.42, the d33-eff reduces due to phase-mixing of the wz-Al1-xScxN phase with cubic-Sc3AlN phase till the piezoelectricity finally disappear at x = 0.51