2024/08/07 by Yorick Broens, Hans Butler, Broens, Yorick +7
Engineering · #37M15 #Control Systems in Engineering #FOS: Electrical engineering #G.2.0 #J.2 #Mechanics and Biomechanics Studies #Robotic Mechanisms and Dynamics #Systems and Control (eess.SY) #electronic engineering #information engineering
paper · pdf · doi:10.48550/arxiv.2408.03642
openalex publication_date 2024/08/07 · openalex created_date 2024/11/01 · openalex updated_date 2026/07/28
Growing demands in the semiconductor industry necessitate increasingly stringent requirements on throughput and positioning accuracy of lithographic equipment. Meeting these demands involves employing highly aggressive motion profiles, which introduce position-dependent flexible dynamics, thus compromising achievable position tracking performance. This paper introduces a control approach enabling active compensation of position-dependent flexible dynamics by extending the conventional rigid-body control structure to include active control of flexible dynamics. To facilitate real-time implementation of the control algorithm, appropriate position-dependent weighting functions are introduced, ensuring computationally efficient execution of the proposed approach. The efficacy of the proposed control design approach is demonstrated through experiments conducted on a state-of-the-art extreme ultraviolet (EUV) wafer stage.