2017/05/23 by Nicholas Becker, A. L. Butterworth, Becker, Nicholas G. +15
Materials Science · Physics and Astronomy · #Electron and X-Ray Spectroscopy Techniques #FOS: Physical sciences #Instrumentation and Detectors (physics.ins-det) #Machine Learning in Materials Science #Materials Science (cond-mat.mtrl-sci) #X-ray Spectroscopy and Fluorescence Analysis
paper · pdf · doi:10.48550/arxiv.1705.08403
openalex publication_date 2017/05/23 · openalex created_date 2022/09/12 · openalex updated_date 2026/07/28
The use of Standard Reference Materials (SRM) from the National Institute of\nStandards and Technology (NIST) for quantitative analysis of chemical\ncomposition using Synchrotron based X-Ray Florescence (SR-XRF) and Scanning\nTransmission X-Ray Microscopy (STXM) is common. These standards however can\nsuffer from inhomogeneity in chemical composition and thickness and often\nrequire further calculations, based on sample mounting and detector geometry,\nto obtain quantitative results. These inhomogeneities negatively impact the\nreproducibility of the measurements and the quantitative measure itself. Atomic\nLayer Deposition (ALD) is an inexpensive, scalable deposition technique known\nfor producing uniform, conformal films of a wide range of compounds on nearly\nany substrate material. These traits make it an ideal deposition method for\nproducing films to replace the NIST standards and create SRM on a wide range of\nrelevant 2D and 3D substrates. Utilizing Rutherford Backscattering, X-ray\nReflectivity, Quartz crystal microbalance, STXM, and SR-XRF we show that ALD is\ncapable of producing films that are homogenous over scales ranging from 100's\nof microns to nms\n