2014/03/19 by Lu Zhao, Zhao, Lu, Yirong Jin +13
Engineering · Physics and Astronomy · #Advancements in Photolithography Techniques #FOS: Physical sciences #Force Microscopy Techniques and Applications #Nanofabrication and Lithography Techniques #Superconductivity (cond-mat.supr-con) #cond-mat.supr-con
paper · pdf · doi:10.48550/arxiv.1403.4666
arxiv created 2014/03/19 · openalex publication_date 2014/03/19 · arxiv updated 2014/03/20 · openalex created_date 2016/09/16 · openalex updated_date 2026/07/28
Nanoimprint lithography (NIL) is an attractive nonconventional lithographic technique in the fabrication of superconducting nanowires for superconducting nanowire single-photon detectors (SNSPDs) with large effective detection areas or multi-element devices consisting of hundreds of SNSPDs, due to its low cost and high throughput. In this work, NIL was used to pattern superconducting nanowires with meander-type structures based on ultra-thin (~4 nm) Nb films deposited by DC-magnetron sputtering at room temperature. A combination of thermal-NIL and UV-NIL was exploited to transfer the meander pattern from the imprint hard mold to Nb films. The hard mold based on Si wafer was defined by e-beam lithography (EBL), which was almost nonexpendable due to the application of IPS as a soft mold to transfer the patterns to the imprint resist in the NIL process. The specimens fabricated by NIL keep good superconducting properties which are comparable to that by conventional EBL process.