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Effects of substrate anisotropy and edge diffusion on submonolayer\n growth during molecular beam epitaxy: A Kinetic Monte Carlo study

2019/12/10 by Jagannath Devkota, Devkota, Jagannath, Shrestha, Shankar P. +1
Earth and Planetary Sciences · Physics and Astronomy · #nanoparticles nucleation surface interactions #Advanced Chemical Physics Studies #Surface and Thin Film Phenomena

paper · pdf · doi:10.48550/arxiv.1912.05918

Abstract

We have performed Kinetic Monte Carlo simulation work to study the effect of\ndiffusion anisotropy, bonding anisotropy and edge diffusion on island formation\nat different temperatures during the sub-monolayer film growth in Molecular\nBeam Epitaxy. We use simple cubic solid on solid model and event based Bortz,\nKalos and Labowitch (BKL) algorithm on the Kinetic Monte Carlo method to\nsimulate the physical phenomena. We have found that the island morphology and\ngrowth exponent are found to be influenced by substrate anisotropy as well as\nedge diffusion, however they do not play a significant role in island\nelongation. The growth exponent and island size distribution are observed to be\ninfluenced by substrate anisotropy but are negligibly influenced by edge\ndiffusion. We have found fractal islands when edge diffusion is excluded and\ncompact islands when edge diffusion is included.\n

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