Formation of a boron-oxide termination for the (100) diamond surface

2024/02/06 by Alex K. Schenk, Schenk, Alex K., Rebecca Griffin +7
Materials Science · #Diamond and Carbon-based Materials Research #FOS: Physical sciences #Materials Science (cond-mat.mtrl-sci)

paper · pdf · doi:10.48550/arxiv.2402.03940

openalex publication_date 2024/02/06 · openalex created_date 2025/10/10 · openalex updated_date 2026/07/28

Abstract

A boron-oxide termination of the diamond (100) surface has been formed by depositing molecular boron oxide \rmB₂O₃ onto the hydrogen-terminated (100) diamond surface under ultrahigh vacuum conditions and annealing to \rm950^∘ C. The resulting termination was highly oriented and chemically homogeneous, although further optimisation is required to increase the surface coverage beyond the 0.4 ML achieved here. This work demonstrates the possibility of using molecular deposition under ultrahigh vacuum conditions for complex surface engineering of the diamond surface, and may be a first step in an alternative approach to fabricating boron doped delta layers in diamond.

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