2025/04/28 by Huo, Fangfang, Hartig, Manuel, Otto Seibertz, Bertwin Bilgrim +5
#600 Technik #Medizin #TCO #Ta-doped Tin Oxide #Technologie #angewandte Wissenschaften::600 Technik::600 Technik #hollow cathode gas flow sputtering #optical and electrical characterization #transparent conductive oxide
paper · doi:10.14279/depositonce-23526
Transparent conductive Ta-doped SnO2 (SnO2: Ta) thin film with low surface roughness, low resistivity, and high carrier concentration is one potential alternative of commercial transparent conductive oxides (TCOs). Here, we present a protocol for fabricating tin oxide films by hollow cathode gas flow sputtering technology. We describe steps for preparing and cleaning substrate, and film deposition process on the fresh uncorroded float glass substrate. We then detail procedures for measuring the optical and electrical properties of the film. For complete details on the use and execution of this protocol, please refer to Huo et al.1